High density graphite for use in vacuum, industrial process & thin film deposition applications

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We have a large range of High density graphite materials, that we can easily machine into a wide range of components for use in vacuum furnaces, Thin film deposition systems and Plasma processes. Our high tech machine shop is suited to producing both low volume prototype and spares requirements, as well as high volume production quantities. In the vacuum industry graphite is typically used for heating elements, wafer carriers, RF / HF Susceptors, Electrodes, evaporation crucibles, screws, supports, jigs and fixtures.

High density graphite is light weight, with good compressive strength and is very stable chemically. It will start to oxidize at 450 °C, but can be used up to 2800 °C in a vacuum or a reducing atmosphere. It has good thermal properties, with a low coefficient of thermal expansion (CTE in the range 4.4-5.5 x10E-6 /deg K) and good resistance to thermal shock. It is electrically conductive, making it an ideal heater element material. It is available in standard purity (approximately 0.1% ash) and high purity (approximately 10ppm ash).

There are two main problems that can be experienced when using high density graphite in semiconductor or vacuum process environments. These are particle contamination and excessive outgasing. Both of these problems can be eliminated by coating the graphite component after machining. We can coat graphite components with a range of materials to suit various applications and different graphite base grades. Refer to coatings page for details.

For information and a quotation on any of the above, please do not hesitate to contact us. Our prices our amongst the best available and our quality unbeatable!